More Skin Ingredients :
4-t-Butylcyclohexanol
(Masking,Perfuming)
Cocamidopropyl Betaine (Surfactant)
Indeclustered Water (-)/Water De-Structuree (-),Declustered Water (+)/Water De-Structuree (+)
Hydrolyzed Rhodophyceae Extract (Microalgae Rhodella Violacea)
Tetrapotassium Pyrophosphate
(Chelating Agent,Ph Adjuster,Buffering Agent,Anticorrosive)
